On the other hand, the etched floor roughness outcomes of Si offered in Fig.18b don’t present any focus range the place smoother floor may be obtained. Optical microscope pictures of the etched Si floor introduced in Fig.19 indicate that the sleek etched floor without hillocks may be obtained in forty five wt% KOH at a hundred thirty five °C. 16, 17, 18, 19 must be used as reference to find the optimum etching situation to obtain high-speed etching with smoother etched floor. The emergence of micro-pyramids does not directly lower common etch price, because footprint of the micro-pyramids is much lower than the entire etched surface area.
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